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Monday, April 21, 2014

'Best in Show' Footprint International Winner

How very exciting! I just learned that I'm the winner of the 'Best in Show' award at the Footprint International Competition at the Center for Contemporary Printmaking in Norwalk, Connecticut. Two of my prints - Return and Waving Goodbye - were selected by Juror Elisabeth Hodermansky, Sutphin Family Senior Associate Curator of Prints, Drawings, Photographs at the Yale University Art Gallery. To see all the winners, please go the website of the CCP.
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2 comments:

  1. DeAnn ProsiaMay 13, 2014 at 3:33 PM

    Hi Miriam,
    I've been admiring your work since I saw it in the last Footprint Exhibition. Glad to see you are in the show again and congratulations! If you are at the opening I will make sure to introduce myself.
    DeAnn Prosia

    ReplyDelete
  2. Miriam RudolphMay 13, 2014 at 3:42 PM

    Thanks, DeAnn.
    Unfortunately I'm too far away to be able to make it to the opening.
    Miriam

    ReplyDelete

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